A common aspect of photonic devices is the presence of critical components which emit, transmit, modulate, amplify, divide, switch or otherwise process light over the whole spectrum from ultraviolet over the visible to the near-, mid- and far-infrared. Particles and residues absorb, attenuate, or obscure light. As such, critical light-processing elements of photonic devices must be free of surface particles and residues to properly function. Photonic devices require effective (and sometimes very selective) surface cleaning and treatment during various stages of fabrication and test, for example during assembly, following polishing, soldering, wire bonding, or in preparation for the application of thin-film coatings or for adhesive bonding. Moreover functional photonic devices such as fiberoptic connectors and lenses require critical cleaning as part of a preventive maintenance program to ensure continued reliable performance.
Our advanced CO2 Composite Spray™ cleaning technology was developed to address the drawbacks and limitations of conventional CO2 snow spray cleaning for optical device cleaning, affording several spray cleaning process control and performance advantages such as cleaning spray composition control, energy control, and easier adaptability to automation equipment and processes. CO2 consumption is reduced significantly while spray cleaning control and performance is greatly improved over conventional CO2 snow cleaning.